As noted earlier, TCAD-based AI models are ideal when limited fab data is available. As the process starts to mature and the ...

In EUV lithography, and especially high-numerical-aperture EUV, balancing tradeoffs between resolution, sensitivity and line-width roughness is becoming increasingly difficult. Lithography patterning ...

Consequently, the industry made the switch from 2D planar transistors to 3D fin field-effect transistors, abbreviated as FinFETs. In FinFET transistors, the gate wraps around the channel on three ...

Pre-market: 4:03:36 am GMT-4 Loading Chart for SNPS ...